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EUV lithography systems – Products | ASML
https://www.asml.com/en/products/euv-lithography-systems
WEBUsing extreme ultraviolet (EUV) light, our NXE and EXE systems deliver high-resolution lithography and make mass production of the world’s most advanced microchips possible. EUV lithography does big things on a tiny scale.
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Making EUV: from lab to fab – Stories | ASML
https://www.asml.com/en/news/stories/2022/making-euv-lab-to-fab
WEBMar 30, 2022 · Four decades, billions in R&D, a vital merger, thousands of people around the world: bringing EUV lithography to high-volume manufacturing was an immense effort. Learn about the pivotal moments that happened on the way to launching ASML’s first EUV system, as well as a glimpse of what’s next.
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5 things you should know about High NA in EUV - asml.com
https://www.asml.com/en/news/stories/2024/5-things-high-na-euv
WEBJan 25, 2024 · 4-minute read - By Christine Middleton, January 25, 2024. After a decade of R&D, ASML shipped the first modules of the first High NA EUV lithography system to Intel in December 2023. The TWINSCAN EXE:5000 represents a significant step forward for cutting-edge chip manufacturing.
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Light & lasers - Lithography principles| ASML
https://www.asml.com/en/technology/lithography-principles/light-and-lasers
WEBCreating EUV light. EUV lithography, a technology entirely unique to ASML, uses light with a wavelength of 13.5 nanometers. This wavelength is more than 14 times shorter than DUV light. EUV light occurs naturally in outer space. But to make EUV lithography possible, we needed to engineer a way to create such light within a system.
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Extreme ultraviolet lithography - Wikipedia
https://en.wikipedia.org/wiki/Extreme_ultraviolet_lithography
WEBAs of 2023, ASML Holding is the only company that produces and sells EUV systems for chip production, targeting 5 nanometer (nm) and 3 nm process nodes.
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TWINSCAN EXE:5000 – EUV lithography systems | ASML
https://www.asml.com/en/products/euv-lithography-systems/twinscan-exe-5000
WEBThe TWINSCAN EXE:5000 is the first 0.55 NA, or ‘High NA’, EUV lithography system. Its 8 nm resolution will enable chipmakers to print with a single exposure features 1.7 times smaller – and therefore achieve transistor densities 2.9 times higher – than those possible using TWINSCAN NXE EUV systems.
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Semiconductor Equipment Maker ASML Ships Second 'High NA' EUV …
https://www.usnews.com/news/technology/articles/2024-04-17/semiconductor-equipment-maker-asml-ships-second-high-na-euv-machine
WEBApr 17, 2024 · AMSTERDAM (Reuters) - ASML, the biggest supplier of equipment to computer chip makers, said on Wednesday said it has shipped one of its newest "High NA" EUV lithography systems to a second customer.
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Indistinguishable from magic: the EUV pellicle – Stories | ASML
https://www.asml.com/en/news/stories/2022/the-euv-pellicle-indistinguishable-from-magic
WEBSep 14, 2022 · ASML has been using pellicles for a long time in DUV (deep ultraviolet) lithography systems, but the stakes were raised when we developed EUV lithography technology. To transmit light of just 13.5 nanometers, the EUV pellicle had to be thinner and be able to withstand much higher temperatures inside the machine.
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Intel finishes assembly of ASML's first High-NA EUV tool, ready …
https://www.tweaktown.com/news/97702/intel-finishes-assembly-of-asmls-first-high-na-euv-tool-ready-for-14a-process-in-2025/index.html
WEB5 days ago · ASML provided Intel, its first customer, with the $380 million Twinscan EXE:5000 High-NA lithography machine. Yesterday, it shipped its second High-NA EUV lithography machine to a mystery customer.
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Lithography principles - Technology | ASML
https://www.asml.com/en/technology/lithography-principles
WEBLight & lasers. From visible blue light to invisible extreme UV light, our lithography machines keep innovation in light and lasers moving forward. Lenses & mirrors. The complex optical systems in our lithography machines reduce the image to be printed on a wafer to the nanometer level. Mechanics & mechatronics.
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